Tetra-sigma bonding adsorption of pyridine on Si(100)-2x1

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dc.contributor.authorLee, HKko
dc.contributor.authorKim, KJko
dc.contributor.authorKang, THko
dc.contributor.authorKim, Sehunko
dc.contributor.authorChung, JWko
dc.contributor.authorKim, Bko
dc.date.accessioned2009-09-21T05:29:09Z-
dc.date.available2009-09-21T05:29:09Z-
dc.date.created2012-02-06-
dc.date.created2012-02-06-
dc.date.issued2008-07-
dc.identifier.citationJOURNAL OF ELECTRON SPECTROSCOPY AND RELATED PHENOMENA, v.164, no.1-3, pp.44 - 47-
dc.identifier.issn0368-2048-
dc.identifier.urihttp://hdl.handle.net/10203/11366-
dc.description.abstractWe studied adsorption of pyridine on Si(100) at room temperature using high resolution photoemission spectroscopy (PES) and near edge X-ray adsorption fine structure (NEXAFS) in the partial electron yield (PEY) mode. The Si 2p, C 1s, N 1s spectra of pyridine on Si(100) showed that pyridine is chemisorbed on Si(100)-2 x 1 through the formation of the tetra-sigma-bonded structure with the N atom and three C atoms. NEXAFS was conducted to characterize the adsorption geometry of pyridine on Si(100). The pi* orbital of C=C bond showed a good angle dependence in C K-edge NEXAFS spectra, and we were able to estimate the adsorption angle between chemisorbed pyridine of C=C bond and the Si(100) Surface using an analytical solution of NEXAFS intensity. We find the coexistence of two different tight bridges with the adsorption angles 42 +/- 21 degrees and 45 +/- 21 degrees with almost equal abundance. (C) 2008 Elsevier B.V. All rights reserved.-
dc.description.sponsorshipThis work was supported by the Korea Research Foundation Grant funded by the Korean Government(MOEHRD) (KRF-2006- 311-C00307).en
dc.languageEnglish-
dc.language.isoen_USen
dc.publisherELSEVIER SCIENCE BV-
dc.subjectSPECTROSCOPY-
dc.subjectSURFACES-
dc.subjectPYRROLE-
dc.subjectX-1-
dc.subjectPHOTOEMISSION-
dc.subjectTEMPERATURE-
dc.subjectELECTRONICS-
dc.subjectBEAMLINE-
dc.subjectFILMS-
dc.titleTetra-sigma bonding adsorption of pyridine on Si(100)-2x1-
dc.typeArticle-
dc.identifier.wosid000258050700007-
dc.identifier.scopusid2-s2.0-45949110205-
dc.type.rimsART-
dc.citation.volume164-
dc.citation.issue1-3-
dc.citation.beginningpage44-
dc.citation.endingpage47-
dc.citation.publicationnameJOURNAL OF ELECTRON SPECTROSCOPY AND RELATED PHENOMENA-
dc.identifier.doi10.1016/j.elspec.2008.05.005-
dc.embargo.liftdate9999-12-31-
dc.embargo.terms9999-12-31-
dc.contributor.localauthorKim, Sehun-
dc.contributor.nonIdAuthorLee, HK-
dc.contributor.nonIdAuthorKim, KJ-
dc.contributor.nonIdAuthorKang, TH-
dc.contributor.nonIdAuthorChung, JW-
dc.contributor.nonIdAuthorKim, B-
dc.type.journalArticleArticle-
dc.subject.keywordAuthorpyridine-
dc.subject.keywordAuthorSi(100)-
dc.subject.keywordAuthoradsorption-
dc.subject.keywordAuthormodification-
dc.subject.keywordAuthorfunctionalization-
dc.subject.keywordAuthorPES-
dc.subject.keywordAuthorNEXAFS-
dc.subject.keywordAuthormolecular orientation-
dc.subject.keywordAuthororganic-semiconductor interface-
dc.subject.keywordPlusSPECTROSCOPY-
dc.subject.keywordPlusSURFACES-
dc.subject.keywordPlusPYRROLE-
dc.subject.keywordPlusX-1-
dc.subject.keywordPlusPHOTOEMISSION-
dc.subject.keywordPlusTEMPERATURE-
dc.subject.keywordPlusELECTRONICS-
dc.subject.keywordPlusBEAMLINE-
dc.subject.keywordPlusFILMS-
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