Modeling of Small Size Effect for MOSFET's Considering the Gradual Doping Profile in the Source/drain Region

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dc.contributor.authorSang-Won Kang-
dc.date.accessioned2013-03-14T21:37:06Z-
dc.date.available2013-03-14T21:37:06Z-
dc.date.created2012-02-06-
dc.date.issued1988-
dc.identifier.citationProc. of 19th Annul Conf. on Modeling and Simulation, v., no., pp.1905 --
dc.identifier.urihttp://hdl.handle.net/10203/113581-
dc.languageENG-
dc.titleModeling of Small Size Effect for MOSFET's Considering the Gradual Doping Profile in the Source/drain Region-
dc.typeConference-
dc.type.rimsCONF-
dc.citation.beginningpage1905-
dc.citation.publicationnameProc. of 19th Annul Conf. on Modeling and Simulation-
dc.identifier.conferencecountryUnited States-
dc.contributor.localauthorSang-Won Kang-
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MS-Conference Papers(학술회의논문)
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