DC Field | Value | Language |
---|---|---|
dc.contributor.author | Euisik Yoon | - |
dc.date.accessioned | 2013-03-14T20:56:33Z | - |
dc.date.available | 2013-03-14T20:56:33Z | - |
dc.date.created | 2012-02-06 | - |
dc.date.issued | 1992 | - |
dc.identifier.citation | Proc. SPIE, v., no., pp.419 - 431 | - |
dc.identifier.uri | http://hdl.handle.net/10203/113209 | - |
dc.language | ENG | - |
dc.title | Application of a Dielectric Discontinuity Microscope to Process Development at the Fairchild Research Center of National Semiconductor | - |
dc.type | Conference | - |
dc.type.rims | CONF | - |
dc.citation.beginningpage | 419 | - |
dc.citation.endingpage | 431 | - |
dc.citation.publicationname | Proc. SPIE | - |
dc.identifier.conferencecountry | United States | - |
dc.contributor.localauthor | Euisik Yoon | - |
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