The Formation of Resist Proflie by TMSDEA-Treatment and Dry Development Based on Oxygen-Helium RIE
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | Sang-Won Kang | - |
| dc.date.accessioned | 2013-03-14T20:55:38Z | - |
| dc.date.available | 2013-03-14T20:55:38Z | - |
| dc.date.created | 2012-02-06 | - |
| dc.date.issued | 1990 | - |
| dc.identifier.citation | Proc. of International Conf. on Microlithograpy, v., no., pp. - | - |
| dc.identifier.uri | http://hdl.handle.net/10203/113201 | - |
| dc.language | ENG | - |
| dc.title | The Formation of Resist Proflie by TMSDEA-Treatment and Dry Development Based on Oxygen-Helium RIE | - |
| dc.type | Conference | - |
| dc.type.rims | CONF | - |
| dc.citation.publicationname | Proc. of International Conf. on Microlithograpy | - |
| dc.identifier.conferencecountry | Belgium | - |
| dc.contributor.localauthor | Sang-Won Kang | - |
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