The Formation of Resist Proflie by TMSDEA-Treatment and Dry Development Based on Oxygen-Helium RIE

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dc.contributor.authorSang-Won Kang-
dc.date.accessioned2013-03-14T20:55:38Z-
dc.date.available2013-03-14T20:55:38Z-
dc.date.created2012-02-06-
dc.date.issued1990-
dc.identifier.citationProc. of International Conf. on Microlithograpy, v., no., pp. --
dc.identifier.urihttp://hdl.handle.net/10203/113201-
dc.languageENG-
dc.titleThe Formation of Resist Proflie by TMSDEA-Treatment and Dry Development Based on Oxygen-Helium RIE-
dc.typeConference-
dc.type.rimsCONF-
dc.citation.publicationnameProc. of International Conf. on Microlithograpy-
dc.identifier.conferencecountryBelgium-
dc.contributor.localauthorSang-Won Kang-
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MS-Conference Papers(학술회의논문)
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