열처리 과정에서의 Lead oxide 와 실리콘 기판과의 상호확산반응Interdiffusion Reaction Between Lead oxide and Silicon Wafer during Heat Treatment
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | 이원규 | - |
| dc.contributor.author | 우성일 | - |
| dc.date.accessioned | 2013-03-14T17:17:22Z | - |
| dc.date.available | 2013-03-14T17:17:22Z | - |
| dc.date.created | 2012-02-06 | - |
| dc.date.issued | 1994-10 | - |
| dc.identifier.citation | 한국화학공학회 추계학술발표회, v., no., pp. - | - |
| dc.identifier.uri | http://hdl.handle.net/10203/111185 | - |
| dc.language | ENG | - |
| dc.publisher | 한국화학공학회 | - |
| dc.title | 열처리 과정에서의 Lead oxide 와 실리콘 기판과의 상호확산반응 | - |
| dc.title.alternative | Interdiffusion Reaction Between Lead oxide and Silicon Wafer during Heat Treatment | - |
| dc.type | Conference | - |
| dc.type.rims | CONF | - |
| dc.citation.publicationname | 한국화학공학회 추계학술발표회 | - |
| dc.identifier.conferencecountry | South Korea | - |
| dc.identifier.conferencecountry | South Korea | - |
| dc.contributor.localauthor | 우성일 | - |
| dc.contributor.nonIdAuthor | 이원규 | - |
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