DC Field | Value | Language |
---|---|---|
dc.contributor.author | Koh, JH | - |
dc.contributor.author | Woo, Seong-Ihl | - |
dc.date.accessioned | 2013-03-14T16:47:03Z | - |
dc.date.available | 2013-03-14T16:47:03Z | - |
dc.date.created | 2012-02-06 | - |
dc.date.issued | 1988 | - |
dc.identifier.citation | The Conference on Semi-conductors, Materizals, Components and Computer Aided Design, v., no., pp.112 - | - |
dc.identifier.uri | http://hdl.handle.net/10203/110912 | - |
dc.language | ENG | - |
dc.title | Modelling and Simulation Study on Chemical Vapor Deposition Process for Silicon Carbide Film | - |
dc.type | Conference | - |
dc.type.rims | CONF | - |
dc.citation.beginningpage | 112 | - |
dc.citation.publicationname | The Conference on Semi-conductors, Materizals, Components and Computer Aided Design | - |
dc.identifier.conferencecountry | South Korea | - |
dc.identifier.conferencecountry | South Korea | - |
dc.contributor.localauthor | Woo, Seong-Ihl | - |
dc.contributor.nonIdAuthor | Koh, JH | - |
Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.