Plasma-Etching induced Damage to Thin Oxide
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | Hyung-Cheol Shin | - |
| dc.date.accessioned | 2013-03-14T16:31:27Z | - |
| dc.date.available | 2013-03-14T16:31:27Z | - |
| dc.date.created | 2012-02-06 | - |
| dc.date.issued | 1992 | - |
| dc.identifier.citation | IEEE/SEMI Advanced Semiconductor Manufacturing Conference, v., no., pp.79 - 83 | - |
| dc.identifier.uri | http://hdl.handle.net/10203/110778 | - |
| dc.language | ENG | - |
| dc.title | Plasma-Etching induced Damage to Thin Oxide | - |
| dc.type | Conference | - |
| dc.type.rims | CONF | - |
| dc.citation.beginningpage | 79 | - |
| dc.citation.endingpage | 83 | - |
| dc.citation.publicationname | IEEE/SEMI Advanced Semiconductor Manufacturing Conference | - |
| dc.identifier.conferencecountry | United States | - |
| dc.identifier.conferencecountry | United States | - |
| dc.contributor.localauthor | Hyung-Cheol Shin | - |
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