Plasma-Etching induced Damage to Thin Oxide

Cited 0 time in webofscience Cited 0 time in scopus
  • Hit : 282
  • Download : 0
DC FieldValueLanguage
dc.contributor.authorHyung-Cheol Shin-
dc.date.accessioned2013-03-14T16:31:27Z-
dc.date.available2013-03-14T16:31:27Z-
dc.date.created2012-02-06-
dc.date.issued1992-
dc.identifier.citationIEEE/SEMI Advanced Semiconductor Manufacturing Conference, v., no., pp.79 - 83-
dc.identifier.urihttp://hdl.handle.net/10203/110778-
dc.languageENG-
dc.titlePlasma-Etching induced Damage to Thin Oxide-
dc.typeConference-
dc.type.rimsCONF-
dc.citation.beginningpage79-
dc.citation.endingpage83-
dc.citation.publicationnameIEEE/SEMI Advanced Semiconductor Manufacturing Conference-
dc.identifier.conferencecountryUnited States-
dc.identifier.conferencecountryUnited States-
dc.contributor.localauthorHyung-Cheol Shin-
Appears in Collection
RIMS Conference Papers
Files in This Item
There are no files associated with this item.

qr_code

  • mendeley

    citeulike


rss_1.0 rss_2.0 atom_1.0