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Adhesion enhancement of norbornene polymers with lithocholate substituents for 193-nm resists Kim, Jin-Baek; Ko, JS; Jang, JH; Choi, JH; Lee, BW, POLYMER JOURNAL, v.36, no.1, pp.18 - 22, 2004 |
Poly(5-((2-trimethylsilyl-2-propyl)oxycarbonyl)-norbornene-co-maleic anhydride) for 193-nm lithography Kim, Jin-Baek; Lee, JJ; Kang, JS, POLYMER, v.41, no.18, pp.6939 - 6942, 2000-08 |
Poly(t-butyl-3 alpha-(5-norbomene-2-carbonyloxy)-7 alpha,12 alpha-dihydroxy-5 beta-cholan-24-oate-co-maleic anhydride) for a 193-nm photoresist Kim, Jin-Baek; Lee, BW; Kang, JS; Seo, DC; Roh, CH, POLYMER, v.40, no.26, pp.7423 - 7426, 1999-12 |
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