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A positive-working alkaline developable photoresist based on partially tert-Boc-protected calix[4]resorcinarene and a photoacid generator Young-Gil, K; Kim, Jin-Baek; Fujigaya, T; Shibasaki, Y; Ueda, M, JOURNAL OF MATERIALS CHEMISTRY, v.12, no.1, pp.53 - 57, 2002 |
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