Browse "College of Natural Sciences(자연과학대학)" by Author Jung, MH

Showing results 1 to 10 of 10

1
A novel water developable photoresist for deep UV lithography

Kim, Jin-Baek; Jung, MH; Chang, KH, EUROPEAN POLYMER JOURNAL, v.33, no.8, pp.1239 - 1243, 1997

2
Acid diffusion control in chemically amplified resists

Kim, Jin-Baek; Choi, JH; Kwon, YG; Jung, MH; Chang, KH, POLYMER, v.40, no.4, pp.1087 - 1089, 1999-02

3
Carrier density and mobility modifications of the two-dimensional electron gas due to an embedded AlN potential barrier layer in AlxGa1-xN/GaN heterostructures

Kim, TW; Choo, DC; Yoo, KH; Jung, MH; Cho, Yong-Hoon; Lee, JH, JOURNAL OF APPLIED PHYSICS, v.97, pp.1052 - 1057, 2005-05

4
Control of photogenerated acid diffusion and evaporation by copolymerization with a basic monomer

Kim, Jin-Baek; Kwon, YG; Choi, JH; Jung, MH, JOURNAL OF VACUUM SCIENCE TECHNOLOGY B, v.17, no.5, pp.2097 - 2102, 1999

5
Copolymers of camphorsulfonyloxymaleimide and t-BOC protected vinyllactams for applications as single-component resists

Kim, ST; Kim, Jin-Baek; Jung, MH; Ahn, KD, POLYMER BULLETIN, v.39, no.4, pp.423 - 430, 1997

6
Magnetotransport, optical, and electronic subband properties in AlxGa1-xN/AlN/GaN heterostructures

Kim, TW; Choo, DC; Jang, YR; Yoo, KH; Jung, MH; Cho, Yong-Hoon; Lee, JH, SOLID STATE COMMUNICATIONS, v.132, pp.67 - 70, 2004-10

7
Poly(isobornyl methacrylate-co-3-(t-butoxycarbonyl)-1-vinyl-2-caprolactam) for an environmentally stable chemically amplified resist

Kim, Jin-Baek; Choi, JH; Kim, H; Kwon, YG; Jung, MH, POLYMER JOURNAL, v.31, no.9, pp.695 - 699, 1999

8
Reduction of L10 ordering temperature of FePt thin filmsby a thin PtMn underlayer

Ko, HS; Perumal, A.; Kim, KY; Shin, Sung-Chul; Yoon, JB; Jung, MH, 한국자기학회 동계학술대회, 한국자기학회, 2006

9
Synthesis and polymerization of 3-(t-butoxycarbonyl)-1-vinylcaprolactam and application as deep UV resists

Kim, Jin-Baek; Jung, MH; Chang, KH, POLYMER BULLETIN, v.38, no.3, pp.241 - 247, 1997-03

10
Synthesis of copolymers containing 3-hydroxycyclohexyl methacrylate and their application as ArF excimer laser resists

Kim, Jin-Baek; Kim, JY; Jung, MH, POLYMER, v.40, no.1, pp.273 - 276, 1999-01

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