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Showing results 1 to 6 of 6

1
Adhesion enhancement of norbornene polymers with lithocholate substituents for 193-nm resists

Kim, Jin-Baek; Ko, JS; Jang, JH; Choi, JH; Lee, BW, POLYMER JOURNAL, v.36, no.1, pp.18 - 22, 2004

2
Chemically amplified resists based on poly(1,4-dioxaspiro[4.4]nonane-2-methyl methacrylate)

Kim, Jin-Baek; Park, JJ; Jang, JH, POLYMER, v.41, no.1, pp.149 - 153, 2000-01

3
Cyclopropyl-containing photoacid generators for chemically amplified resists

Kim, Jin-Baek; Jang, JH; Kim, HW; Woo, SG, CHEMISTRY LETTERS, v.32, no.6, pp.554 - 555, 2003-06

4
Environmentally friendly negative resists based on acid-catalyzed acetalization for 193-nm lithography

Kim, Jin-Baek; Jang, JH; Ko, JS; Choi, JH; Lee, KK, MACROMOLECULAR RAPID COMMUNICATIONS, v.24, no.15, pp.879 - 882, 2003-10

5
MWCNT/Fibrin Bionanocomposites by in situ Enzymatic Polymerization

Kim, M; Jang, JH; Han, JH; Lee, YW; Cho, SM; Son, SY; Hulme, J; et al, BULLETIN OF THE KOREAN CHEMICAL SOCIETY, v.30, no.2, pp.405 - 408, 2009-02

6
Synthesis and lithographic evaluation of poly [(methaerylic acid tert-butyl cholate ester)-co-(-gamma-butyrolactone-2-yl methacrylate)]

Kim, Jin-Baek; Ko, JS; Choi, JH; Jang, JH; Oh, TH; Kim, HW; Lee, BW, POLYMER, v.45, no.16, pp.5397 - 5401, 2004-07

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