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Showing results 12 to 14 of 14

12
Photobleachable silicon-containing molecular resist for deep UV lithography

Kim, Jin-Baek; Ganesan, Ramakrishnan; Choi, Jae-Hak; Yun, Hyo-Jin; Kwon, Young-Gil; Kim, Kyoung-Seon; Oh, Tae-Hwan, JOURNAL OF MATERIALS CHEMISTRY, v.16, no.34, pp.3448 - 3451, 2006

13
Synthesis of Methacrylate Polymers Substituted with Cholate Derivatives with Polar Spacer and its Lithographic Application

Oh, Tae-Hwan; Kim, Jin-Baek, 한국고분자학회 2001년도 추계학술대회 , pp.162 - 162, 한국고분자학회, 2001-10

14
Synthesis of methacrylate polymers substituted with cholic acid derivatives with polar spacer and their lithographic application = 담즙산 유도체를 포함하고 극성 사슬을 갖는 메타크릴 공중합체의 합성과 포토레지스트로서의 응용link

Oh, Tae-Hwan; 오태환; et al, 한국과학기술원, 2002

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