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193-nm photoresists based on norbornene copolymers with derivatives of bile acid Kim, Jin-Baek; Lee, BW; Yun, HJ; Kwon, YG, CHEMISTRY LETTERS, v.149, pp.414 - 415, 2000-04 |
Adhesion-promoted copolymers based on norbornene derivatives and maleic anhydride for 193-nm photoresists Kim, Jin-Baek; Yun, HJ; Kwon, YG; Lee, BW, POLYMER, v.41, no.22, pp.8035 - 8039, 2000-10 |
Novel molecular resist based on derivative of cholic acid Kim, Jin-Baek; Yun, HJ; Kwon, YG, CHEMISTRY LETTERS, v.40, pp.1064 - 1065, 2002-10 |
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