Relationship between Interfacial Reaction and Adhesion at the PVD TiO2 Film/Metal(Ti or Al) Interface

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dc.contributor.authorPyun, Su Il-
dc.date.accessioned2013-03-14T14:58:34Z-
dc.date.available2013-03-14T14:58:34Z-
dc.date.created2012-02-06-
dc.date.issued1993-
dc.identifier.citationIntern.Conf. on Met.Coatings and Thin Films, v., no., pp. --
dc.identifier.urihttp://hdl.handle.net/10203/109946-
dc.languageENG-
dc.titleRelationship between Interfacial Reaction and Adhesion at the PVD TiO2 Film/Metal(Ti or Al) Interface-
dc.typeConference-
dc.type.rimsCONF-
dc.citation.publicationnameIntern.Conf. on Met.Coatings and Thin Films-
dc.identifier.conferencecountryUnited States-
dc.identifier.conferencecountryUnited States-
dc.contributor.localauthorPyun, Su Il-
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MS-Conference Papers(학술회의논문)
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