Microstructural characterization of heterointerfaces in MOCVD grown InGaAs/GaAs strained-layer system using cross section transmission electron micros

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dc.contributor.authorPark, M. C.-
dc.contributor.authorPark, HyoHoon-
dc.contributor.authorKwon, O. J.-
dc.date.accessioned2013-03-14T14:31:56Z-
dc.date.available2013-03-14T14:31:56Z-
dc.date.created2012-02-06-
dc.date.issued1993-04-05-
dc.identifier.citationInst. Phys. the Royal Microscopical Society Conference: Microscopy of Semiconducting Materials 1993, v., no., pp.481 - 484-
dc.identifier.urihttp://hdl.handle.net/10203/109722-
dc.languageENG-
dc.titleMicrostructural characterization of heterointerfaces in MOCVD grown InGaAs/GaAs strained-layer system using cross section transmission electron micros-
dc.typeConference-
dc.type.rimsCONF-
dc.citation.beginningpage481-
dc.citation.endingpage484-
dc.citation.publicationnameInst. Phys. the Royal Microscopical Society Conference: Microscopy of Semiconducting Materials 1993-
dc.identifier.conferencecountryUnited Kingdom-
dc.identifier.conferencecountryUnited Kingdom-
dc.contributor.localauthorPark, HyoHoon-
dc.contributor.nonIdAuthorPark, M. C.-
dc.contributor.nonIdAuthorKwon, O. J.-
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EE-Conference Papers(학술회의논문)
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