Annealing Behavior of Bias Induced Degradation in a-Si:H TFT's
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | 이주천 | - |
| dc.date.accessioned | 2013-03-14T14:13:46Z | - |
| dc.date.available | 2013-03-14T14:13:46Z | - |
| dc.date.created | 2012-02-06 | - |
| dc.date.issued | 1990 | - |
| dc.identifier.citation | Tech.Digest on Korea-Japan Joint Sym. on Information Display, v., no., pp.115 - 118 | - |
| dc.identifier.uri | http://hdl.handle.net/10203/109570 | - |
| dc.language | KOR | - |
| dc.title | Annealing Behavior of Bias Induced Degradation in a-Si:H TFT's | - |
| dc.type | Conference | - |
| dc.type.rims | CONF | - |
| dc.citation.beginningpage | 115 | - |
| dc.citation.endingpage | 118 | - |
| dc.citation.publicationname | Tech.Digest on Korea-Japan Joint Sym. on Information Display | - |
| dc.identifier.conferencecountry | South Korea | - |
| dc.identifier.conferencecountry | South Korea | - |
| dc.contributor.localauthor | 이주천 | - |
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