DC Field | Value | Language |
---|---|---|
dc.contributor.author | Kim, Jin-Baek | ko |
dc.contributor.author | Jang, JH | ko |
dc.contributor.author | Kim, HW | ko |
dc.contributor.author | Woo, SG | ko |
dc.date.accessioned | 2009-09-02T05:13:52Z | - |
dc.date.available | 2009-09-02T05:13:52Z | - |
dc.date.created | 2012-02-06 | - |
dc.date.created | 2012-02-06 | - |
dc.date.issued | 2003-06 | - |
dc.identifier.citation | CHEMISTRY LETTERS, v.32, no.6, pp.554 - 555 | - |
dc.identifier.issn | 0366-7022 | - |
dc.identifier.uri | http://hdl.handle.net/10203/10932 | - |
dc.description.abstract | Several cyclopropyl-containing photoacid generators (PAGs) were synthesized in order to reduce absorbance at 193 nm and induce the photobleaching effect. From the GC-mass experiment, cleavage of S-C(cyclopropyl) which is more preferential than that of S-C(phenyl) results in photobleaching effect. The resist containing cyclopropyldiphenylsulfonium triflate gave better resolution than the resist containing the conventional PAG, triphenylsulfonium triflate. | - |
dc.description.sponsorship | Ministry of Commerce, Industry & Energy, KAIST BK21 | en |
dc.language | English | - |
dc.language.iso | en_US | en |
dc.publisher | CHEMICAL SOC JAPAN | - |
dc.title | Cyclopropyl-containing photoacid generators for chemically amplified resists | - |
dc.type | Article | - |
dc.identifier.wosid | 000183507100039 | - |
dc.identifier.scopusid | 2-s2.0-0041760410 | - |
dc.type.rims | ART | - |
dc.citation.volume | 32 | - |
dc.citation.issue | 6 | - |
dc.citation.beginningpage | 554 | - |
dc.citation.endingpage | 555 | - |
dc.citation.publicationname | CHEMISTRY LETTERS | - |
dc.embargo.liftdate | 9999-12-31 | - |
dc.embargo.terms | 9999-12-31 | - |
dc.contributor.localauthor | Kim, Jin-Baek | - |
dc.contributor.nonIdAuthor | Jang, JH | - |
dc.contributor.nonIdAuthor | Kim, HW | - |
dc.contributor.nonIdAuthor | Woo, SG | - |
dc.type.journalArticle | Article | - |
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