Cyclopropyl-containing photoacid generators for chemically amplified resists

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dc.contributor.authorKim, Jin-Baekko
dc.contributor.authorJang, JHko
dc.contributor.authorKim, HWko
dc.contributor.authorWoo, SGko
dc.date.accessioned2009-09-02T05:13:52Z-
dc.date.available2009-09-02T05:13:52Z-
dc.date.created2012-02-06-
dc.date.created2012-02-06-
dc.date.issued2003-06-
dc.identifier.citationCHEMISTRY LETTERS, v.32, no.6, pp.554 - 555-
dc.identifier.issn0366-7022-
dc.identifier.urihttp://hdl.handle.net/10203/10932-
dc.description.abstractSeveral cyclopropyl-containing photoacid generators (PAGs) were synthesized in order to reduce absorbance at 193 nm and induce the photobleaching effect. From the GC-mass experiment, cleavage of S-C(cyclopropyl) which is more preferential than that of S-C(phenyl) results in photobleaching effect. The resist containing cyclopropyldiphenylsulfonium triflate gave better resolution than the resist containing the conventional PAG, triphenylsulfonium triflate.-
dc.description.sponsorshipMinistry of Commerce, Industry & Energy, KAIST BK21en
dc.languageEnglish-
dc.language.isoen_USen
dc.publisherCHEMICAL SOC JAPAN-
dc.titleCyclopropyl-containing photoacid generators for chemically amplified resists-
dc.typeArticle-
dc.identifier.wosid000183507100039-
dc.identifier.scopusid2-s2.0-0041760410-
dc.type.rimsART-
dc.citation.volume32-
dc.citation.issue6-
dc.citation.beginningpage554-
dc.citation.endingpage555-
dc.citation.publicationnameCHEMISTRY LETTERS-
dc.embargo.liftdate9999-12-31-
dc.embargo.terms9999-12-31-
dc.contributor.localauthorKim, Jin-Baek-
dc.contributor.nonIdAuthorJang, JH-
dc.contributor.nonIdAuthorKim, HW-
dc.contributor.nonIdAuthorWoo, SG-
dc.type.journalArticleArticle-
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