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College of Natural Sciences(자연과학대학)Dept. of Chemistry(화학과)CH-Journal Papers(저널논문)

Novel top-surface imaging process by selective chemisorption of poly(dimethyl siloxane) on diazoketo-functionalized single component photoresist

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dc.contributor.authorGanesana, Ramakrishnanko
dc.contributor.authorYouna, Seul-Kiko
dc.contributor.authorKim, Jin-Baekko
dc.date.accessioned2009-09-02T01:50:11Z-
dc.date.available2009-09-02T01:50:11Z-
dc.date.created2012-02-06-
dc.date.created2012-02-06-
dc.date.issued2008-03-
dc.identifier.citationMACROMOLECULAR RAPID COMMUNICATIONS, v.29, no.5, pp.437 - 441-
dc.identifier.issn1022-1336-
dc.identifier.urihttp://hdl.handle.net/10203/10928-
dc.description.abstractA novel top-surface imaging process was successfully established using selective chemisorption of amine-functionalized poly(dimethly siloxane) onto the carboxylic groups formed on the surace of diazoketo-functionalized polymer film by UV light irradiation. The chemisorbed poly(dimethyl siloxane) worked as an efficient etch mask for the subsequent oxygen plasma etching process for pattern generation. High-resolution patterns were resolved with the new imaging process.-
dc.description.sponsorshipBrain Korea 21 (BK21) project.en
dc.languageEnglish-
dc.language.isoen_USen
dc.publisherWILEY-V C H VERLAG GMBH-
dc.subjectNONCHEMICALLY AMPLIFIED RESIST-
dc.subjectPOSITIVE RESIST-
dc.subjectELECTRON-BEAM-
dc.subjectLITHOGRAPHY-
dc.subjectFILMS-
dc.subjectSYSTEM-
dc.subjectFABRICATION-
dc.subjectATTACHMENT-
dc.subjectNM-
dc.titleNovel top-surface imaging process by selective chemisorption of poly(dimethyl siloxane) on diazoketo-functionalized single component photoresist-
dc.typeArticle-
dc.identifier.wosid000253934300010-
dc.identifier.scopusid2-s2.0-53649087410-
dc.type.rimsART-
dc.citation.volume29-
dc.citation.issue5-
dc.citation.beginningpage437-
dc.citation.endingpage441-
dc.citation.publicationnameMACROMOLECULAR RAPID COMMUNICATIONS-
dc.identifier.doi10.1002/marc.200700694-
dc.embargo.liftdate9999-12-31-
dc.embargo.terms9999-12-31-
dc.contributor.localauthorKim, Jin-Baek-
dc.type.journalArticleArticle-
dc.subject.keywordAuthordiazoketo-
dc.subject.keywordAuthorlithography-
dc.subject.keywordAuthorphotoresist-
dc.subject.keywordAuthortop-surface imaging-
dc.subject.keywordPlusNONCHEMICALLY AMPLIFIED RESIST-
dc.subject.keywordPlusPOSITIVE RESIST-
dc.subject.keywordPlusELECTRON-BEAM-
dc.subject.keywordPlusLITHOGRAPHY-
dc.subject.keywordPlusFILMS-
dc.subject.keywordPlusSYSTEM-
dc.subject.keywordPlusFABRICATION-
dc.subject.keywordPlusATTACHMENT-
dc.subject.keywordPlusNM-
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