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College of Engineering(공과대학)School of Electrical Engineering(전기및전자공학부)EE-Conference Papers(학술회의논문)

Very light nitridation of thin gate oxide in low pressure N2OVery light nitridation of thin gate oxide in low pressure N2O

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dc.contributor.authorCho, Byung Jin-
dc.contributor.authorJoo, MS-
dc.contributor.authorLee, SH-
dc.contributor.authorKim, JC-
dc.contributor.authorChoi, SH-
dc.date.accessioned2013-03-14T12:05:15Z-
dc.date.available2013-03-14T12:05:15Z-
dc.date.created2012-02-06-
dc.date.issued1994-05-08-
dc.identifier.citation3rd Symp. on Silicon Nitride and Silicon Dioxide Thin Insulation Films, v., no., pp.458 - 458-
dc.identifier.urihttp://hdl.handle.net/10203/108500-
dc.languageENG-
dc.titleVery light nitridation of thin gate oxide in low pressure N2O-
dc.title.alternativeVery light nitridation of thin gate oxide in low pressure N2O-
dc.typeConference-
dc.type.rimsCONF-
dc.citation.beginningpage458-
dc.citation.endingpage458-
dc.citation.publicationname3rd Symp. on Silicon Nitride and Silicon Dioxide Thin Insulation Films-
dc.identifier.conferencecountryUnited States-
dc.identifier.conferencecountryUnited States-
dc.contributor.localauthorCho, Byung Jin-
dc.contributor.nonIdAuthorJoo, MS-
dc.contributor.nonIdAuthorLee, SH-
dc.contributor.nonIdAuthorKim, JC-
dc.contributor.nonIdAuthorChoi, SH-
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EE-Conference Papers(학술회의논문)
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