A Transmission Electron Microscopy Study on the Incubation Time of the Low-Pressure Chemical Vapor Deposited Silicon Thin Films of 9SiO2

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dc.contributor.author이정용ko
dc.date.accessioned2013-03-14T11:45:25Z-
dc.date.available2013-03-14T11:45:25Z-
dc.date.created2012-02-06-
dc.date.issued1994-11-
dc.identifier.citation한국현미경학회 제 25 회 추계학술대회, pp.237 - 253-
dc.identifier.urihttp://hdl.handle.net/10203/108336-
dc.languageKorean-
dc.publisher한국현미경학회-
dc.titleA Transmission Electron Microscopy Study on the Incubation Time of the Low-Pressure Chemical Vapor Deposited Silicon Thin Films of 9SiO2-
dc.typeConference-
dc.type.rimsCONF-
dc.citation.beginningpage237-
dc.citation.endingpage253-
dc.citation.publicationname한국현미경학회 제 25 회 추계학술대회-
dc.identifier.conferencecountryKO-
dc.contributor.localauthor이정용-
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MS-Conference Papers(학술회의논문)
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