Thin Oxide Damage by Plasma Etching and Ashing Processes

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dc.contributor.authorHyung-Cheol Shin-
dc.date.accessioned2013-03-14T08:39:39Z-
dc.date.available2013-03-14T08:39:39Z-
dc.date.created2012-02-06-
dc.date.issued1992-
dc.identifier.citationProc. IEEE International Reliability Phys. Symp., v., no., pp.37 - 41-
dc.identifier.urihttp://hdl.handle.net/10203/107092-
dc.languageENG-
dc.titleThin Oxide Damage by Plasma Etching and Ashing Processes-
dc.typeConference-
dc.type.rimsCONF-
dc.citation.beginningpage37-
dc.citation.endingpage41-
dc.citation.publicationnameProc. IEEE International Reliability Phys. Symp.-
dc.identifier.conferencecountryUnited States-
dc.identifier.conferencecountryUnited States-
dc.contributor.localauthorHyung-Cheol Shin-
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