Nucleation and Growth of Al2O3 on Si in the CVD Processes
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | Chun , Soung Soon | ko |
| dc.date.accessioned | 2013-03-14T07:48:08Z | - |
| dc.date.available | 2013-03-14T07:48:08Z | - |
| dc.date.created | 2012-02-06 | - |
| dc.date.issued | 1984-05 | - |
| dc.identifier.citation | The 9th Int'l Conf. on Chemical Vapor Deposition, The Electrochemical Soc., pp.233 | - |
| dc.identifier.uri | http://hdl.handle.net/10203/106688 | - |
| dc.language | English | - |
| dc.publisher | International Conference on Chemical Vapor Deposition | - |
| dc.title | Nucleation and Growth of Al2O3 on Si in the CVD Processes | - |
| dc.type | Conference | - |
| dc.type.rims | CONF | - |
| dc.citation.beginningpage | 233 | - |
| dc.citation.publicationname | The 9th Int'l Conf. on Chemical Vapor Deposition, The Electrochemical Soc. | - |
| dc.identifier.conferencecountry | US | - |
| dc.identifier.conferencelocation | Cincinnati, OH | - |
| dc.contributor.localauthor | Chun , Soung Soon | - |
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