Effects of Film Thickness and Hydrogen on the Dielectric Property of Passivating Ta2O5 Film
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | 변수일 | - |
| dc.date.accessioned | 2013-03-14T07:26:28Z | - |
| dc.date.available | 2013-03-14T07:26:28Z | - |
| dc.date.created | 2012-02-06 | - |
| dc.date.issued | 1994 | - |
| dc.identifier.citation | Korean Corros. Sci. Soc., v., no., pp.45 - 45 | - |
| dc.identifier.uri | http://hdl.handle.net/10203/106516 | - |
| dc.language | KOR | - |
| dc.title | Effects of Film Thickness and Hydrogen on the Dielectric Property of Passivating Ta2O5 Film | - |
| dc.type | Conference | - |
| dc.type.rims | CONF | - |
| dc.citation.beginningpage | 45 | - |
| dc.citation.endingpage | 45 | - |
| dc.citation.publicationname | Korean Corros. Sci. Soc. | - |
| dc.identifier.conferencecountry | South Korea | - |
| dc.identifier.conferencecountry | South Korea | - |
| dc.contributor.localauthor | 변수일 | - |
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