Characterization of TiO2 thin film prepared by plasma enhanced chemical vapor deposition
- Publisher
- Korea Vacuum Society
- Issue Date
- 1992
- Language
- ENG
- Citation
Korea Vacuum Society Winter Symposium, pp.52 -
- Appears in Collection
- CBE-Conference Papers(학술회의논문)
- Files in This Item
- There are no files associated with this item.
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