Characterization of Sidewall Residue Film and Atomic Structure of the Trench Formed by BCl3/Cl2 Reactive Ion Etching
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | Lee, Jeong Yong | - |
| dc.date.accessioned | 2013-03-14T05:45:40Z | - |
| dc.date.available | 2013-03-14T05:45:40Z | - |
| dc.date.created | 2012-02-06 | - |
| dc.date.issued | 1990-12-01 | - |
| dc.identifier.citation | Materials Research Society, v., no., pp.431 - 431 | - |
| dc.identifier.uri | http://hdl.handle.net/10203/105812 | - |
| dc.language | ENG | - |
| dc.title | Characterization of Sidewall Residue Film and Atomic Structure of the Trench Formed by BCl3/Cl2 Reactive Ion Etching | - |
| dc.type | Conference | - |
| dc.type.rims | CONF | - |
| dc.citation.beginningpage | 431 | - |
| dc.citation.endingpage | 431 | - |
| dc.citation.publicationname | Materials Research Society | - |
| dc.contributor.localauthor | Lee, Jeong Yong | - |
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