Hydrogen transport through TiO2 film prepared by plasma enhanced chemical vapour deposition(PECVD) method

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dc.contributor.authorPyun, Su Il-
dc.contributor.authorYoon Young-Gi-
dc.date.accessioned2013-03-14T05:13:13Z-
dc.date.available2013-03-14T05:13:13Z-
dc.date.created2012-02-06-
dc.date.issued1994-09-11-
dc.identifier.citationProceedings of the 1994 5th International Conference on the Effect of Hydrogen on the Behavior of Materials, v., no., pp.261 - 269-
dc.identifier.urihttp://hdl.handle.net/10203/105583-
dc.languageENG-
dc.titleHydrogen transport through TiO2 film prepared by plasma enhanced chemical vapour deposition(PECVD) method-
dc.typeConference-
dc.identifier.scopusid2-s2.0-0029713891-
dc.type.rimsCONF-
dc.citation.beginningpage261-
dc.citation.endingpage269-
dc.citation.publicationnameProceedings of the 1994 5th International Conference on the Effect of Hydrogen on the Behavior of Materials-
dc.identifier.conferencecountryUnited States-
dc.identifier.conferencecountryUnited States-
dc.contributor.localauthorPyun, Su Il-
dc.contributor.nonIdAuthorYoon Young-Gi-
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NE-Conference Papers(학술회의논문)
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