Charaterization of Silylation and Wet Develop in Novolac/diazonaphthoquinone Resist System
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | Kim, JT | - |
| dc.contributor.author | Woo, Seong-Ihl | - |
| dc.date.accessioned | 2013-03-14T04:47:55Z | - |
| dc.date.available | 2013-03-14T04:47:55Z | - |
| dc.date.created | 2012-02-06 | - |
| dc.date.issued | 1993 | - |
| dc.identifier.citation | International Workshop on Process and Device of scaled LSI'S, v., no., pp.69 - 75 | - |
| dc.identifier.uri | http://hdl.handle.net/10203/105409 | - |
| dc.language | ENG | - |
| dc.title | Charaterization of Silylation and Wet Develop in Novolac/diazonaphthoquinone Resist System | - |
| dc.type | Conference | - |
| dc.type.rims | CONF | - |
| dc.citation.beginningpage | 69 | - |
| dc.citation.endingpage | 75 | - |
| dc.citation.publicationname | International Workshop on Process and Device of scaled LSI'S | - |
| dc.identifier.conferencecountry | South Korea | - |
| dc.identifier.conferencecountry | South Korea | - |
| dc.contributor.localauthor | Woo, Seong-Ihl | - |
| dc.contributor.nonIdAuthor | Kim, JT | - |
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