DC Field | Value | Language |
---|---|---|
dc.contributor.author | Hyung-Cheol Shin | - |
dc.date.accessioned | 2013-03-14T04:33:08Z | - |
dc.date.available | 2013-03-14T04:33:08Z | - |
dc.date.created | 2012-02-06 | - |
dc.date.issued | 1993 | - |
dc.identifier.citation | Proc. 11th International Syposium on Plasma Chemistry, v., no., pp.1534 - 1539 | - |
dc.identifier.uri | http://hdl.handle.net/10203/105291 | - |
dc.language | ENG | - |
dc.title | Characterization of oxide Charging in a Magnetically Enhanced Rie Polysilicon Etcher | - |
dc.type | Conference | - |
dc.type.rims | CONF | - |
dc.citation.beginningpage | 1534 | - |
dc.citation.endingpage | 1539 | - |
dc.citation.publicationname | Proc. 11th International Syposium on Plasma Chemistry | - |
dc.identifier.conferencecountry | United Kingdom | - |
dc.identifier.conferencecountry | United Kingdom | - |
dc.contributor.localauthor | Hyung-Cheol Shin | - |
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