Synthessis and Characterization of Novel Volatile Imido-Aminoalkoxide Tantalum Compounds

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dc.contributor.authorPark, Bo-Keunko
dc.contributor.authorKim, Hyo-Sukko
dc.contributor.authorShin, Su-Jungko
dc.contributor.authorMin, Jae-Kiko
dc.contributor.authorLee, Kang-Munko
dc.contributor.authorDo, Young-Kyuko
dc.contributor.authorKim, Chang-Gyounko
dc.contributor.authorChung, Taek-Moko
dc.date.accessioned2013-03-12T16:33:17Z-
dc.date.available2013-03-12T16:33:17Z-
dc.date.created2013-01-07-
dc.date.created2013-01-07-
dc.date.issued2012-12-
dc.identifier.citationORGANOMETALLICS, v.31, no.23, pp.8109 - 8113-
dc.identifier.issn0276-7333-
dc.identifier.urihttp://hdl.handle.net/10203/102879-
dc.description.abstractA novel Ta(V) Bu-t-imido/aminoalkoxide complex, Ta((NBu)-Bu-t)(dmamp)(2)Cl (1), was synthesized by metathesis reaction between Ta((NBu)-Bu-t)Cl-3(py)(2) and 2 equiv of Na-(dmamp), and subsequent reaction of 1 with 1 equiv of MeLi gave a new tantalum complex, Ta((NBu)-Bu-t)(dmamp)(2)Me (2). Compounds 1 and 2 have been characterized by IR, H-1 and C-13 NMR spectroscopy, and microanalytical data. The molecular structure of 1, determined by X-ray single crystallography, revealed distorted octahedral geometry. The behavior of compound 1 in solution was studied by variable-temperature H-1 NMR spectra. Thermogravimetric analysis revealed superior thermal properties of 2 as compared to those of 1.-
dc.languageEnglish-
dc.publisherAMER CHEMICAL SOC-
dc.subjectATOMIC LAYER DEPOSITION-
dc.subjectCHEMICAL-VAPOR-DEPOSITION-
dc.subjectOXIDE THIN-FILMS-
dc.subjectDIAMIDO-PYRIDINE LIGANDS-
dc.subjectHIGH THERMAL-STABILITY-
dc.subjectMETAL NITRIDE FILMS-
dc.subjectHYDRODENITROGENATION CATALYSIS-
dc.subjectDIELECTRIC APPLICATIONS-
dc.subjectORGANOIMIDO COMPLEXES-
dc.subjectALKYLAMIDE PRECURSORS-
dc.titleSynthessis and Characterization of Novel Volatile Imido-Aminoalkoxide Tantalum Compounds-
dc.typeArticle-
dc.identifier.wosid000312035500014-
dc.identifier.scopusid2-s2.0-84870865822-
dc.type.rimsART-
dc.citation.volume31-
dc.citation.issue23-
dc.citation.beginningpage8109-
dc.citation.endingpage8113-
dc.citation.publicationnameORGANOMETALLICS-
dc.identifier.doi10.1021/om300436p-
dc.embargo.liftdate9999-12-31-
dc.embargo.terms9999-12-31-
dc.contributor.localauthorDo, Young-Kyu-
dc.contributor.nonIdAuthorPark, Bo-Keun-
dc.contributor.nonIdAuthorKim, Hyo-Suk-
dc.contributor.nonIdAuthorShin, Su-Jung-
dc.contributor.nonIdAuthorMin, Jae-Ki-
dc.contributor.nonIdAuthorKim, Chang-Gyoun-
dc.contributor.nonIdAuthorChung, Taek-Mo-
dc.type.journalArticleArticle-
dc.subject.keywordPlusATOMIC LAYER DEPOSITION-
dc.subject.keywordPlusCHEMICAL-VAPOR-DEPOSITION-
dc.subject.keywordPlusOXIDE THIN-FILMS-
dc.subject.keywordPlusDIAMIDO-PYRIDINE LIGANDS-
dc.subject.keywordPlusHIGH THERMAL-STABILITY-
dc.subject.keywordPlusMETAL NITRIDE FILMS-
dc.subject.keywordPlusHYDRODENITROGENATION CATALYSIS-
dc.subject.keywordPlusDIELECTRIC APPLICATIONS-
dc.subject.keywordPlusORGANOIMIDO COMPLEXES-
dc.subject.keywordPlusALKYLAMIDE PRECURSORS-
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