DC Field | Value | Language |
---|---|---|
dc.contributor.author | Bhatnagar, Nitu | ko |
dc.contributor.author | Jha, Sangeeta | ko |
dc.contributor.author | Bhowmik, Shantanu | ko |
dc.contributor.author | Gupta, Govind | ko |
dc.contributor.author | Moon, Jin-Bum | ko |
dc.contributor.author | Kim, Chun-Gon | ko |
dc.date.accessioned | 2013-03-12T12:43:18Z | - |
dc.date.available | 2013-03-12T12:43:18Z | - |
dc.date.created | 2012-08-08 | - |
dc.date.created | 2012-08-08 | - |
dc.date.issued | 2012-03 | - |
dc.identifier.citation | SURFACE ENGINEERING AND APPLIED ELECTROCHEMISTRY, v.48, no.2, pp.117 - 126 | - |
dc.identifier.issn | 1068-3755 | - |
dc.identifier.uri | http://hdl.handle.net/10203/102361 | - |
dc.description.abstract | In this work, the effect of low pressure plasma and atmospheric-pressure plasma treatment on surface properties and adhesion characteristics of high performance polymer, Polyether Ether Ketone (PEEK) are investigated in terms of Fourier Transform Infrared Spectroscopy (FTIR), X-ray photoelectron spectroscopy (XPS), and Atomic Force Microscopy (AFM). The experimental results show that the PEEK surface treated by atmospheric pressure plasma lead to an increase in the polar component of the surface energy, resulting in improving the adhesion characteristics of the PEEK/Epoxy adhesive system. Also, the roughness of the treated surfaces is largely increased as confirmed by AFM observation. These results can be explained by the fact that the atmospheric pressure plasma treatment of PEEK surface yields several oxygen functionalities on hydrophobic surface, which play an important role in increasing the surface polarity, wettability, and the adhesion characteristics of the PEEK/Epoxy adhesive system. | - |
dc.language | English | - |
dc.publisher | ALLERTON PRESS INC | - |
dc.subject | SURFACE MODIFICATION | - |
dc.subject | OXYGEN PLASMA | - |
dc.subject | FILMS | - |
dc.subject | POLYIMIDE | - |
dc.title | Physico-chemical characteristics of high performance polymer modified by low and atmospheric pressure plasma | - |
dc.type | Article | - |
dc.identifier.wosid | 000304445200004 | - |
dc.identifier.scopusid | 2-s2.0-84861500950 | - |
dc.type.rims | ART | - |
dc.citation.volume | 48 | - |
dc.citation.issue | 2 | - |
dc.citation.beginningpage | 117 | - |
dc.citation.endingpage | 126 | - |
dc.citation.publicationname | SURFACE ENGINEERING AND APPLIED ELECTROCHEMISTRY | - |
dc.identifier.doi | 10.3103/S1068375512020032 | - |
dc.embargo.liftdate | 9999-12-31 | - |
dc.embargo.terms | 9999-12-31 | - |
dc.contributor.localauthor | Kim, Chun-Gon | - |
dc.contributor.nonIdAuthor | Bhatnagar, Nitu | - |
dc.contributor.nonIdAuthor | Jha, Sangeeta | - |
dc.contributor.nonIdAuthor | Bhowmik, Shantanu | - |
dc.contributor.nonIdAuthor | Gupta, Govind | - |
dc.type.journalArticle | Article | - |
dc.subject.keywordPlus | SURFACE MODIFICATION | - |
dc.subject.keywordPlus | OXYGEN PLASMA | - |
dc.subject.keywordPlus | FILMS | - |
dc.subject.keywordPlus | POLYIMIDE | - |
Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.