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A novel molecular resist for EUV lithography = 극 자외선 리소그래피용 분자 레지스트에 관한 연구link Jeong, Sun-Hwa; 정선화; et al, 한국과학기술원, 2013 |
Synthesis and evaluation of novel organoelement resists for EUV lithography Dai, J.; Ober, C.K.; Kim, Sang Ouk; Nealey, P.; Golovkina, V.; Shin, J.; Wang, L.; et al, PROCEEDINGS OF SPIE - THE INTERNATIONAL SOCIETY FOR OPTICAL ENGINEERING, v.5039 II, no.0, pp.1164 - 1172, 2003 |
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