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Computational Characterization of a New Inductively Coupled Plasma Source for Application to Narrow Gap Plasma Processes

Kim, Dae Woong; You, Shin Jae; Kim, Jung Hyun; Chang, Hongyoung; Oh, Wang-Yuhl, IEEE TRANSACTIONS ON PLASMA SCIENCE, v.43, no.11, pp.3876 - 3882, 2015-11

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