Browse by Subject X-ray lithography
Showing results 1 to 7 of 7
| A comparison between leakage currents in thin gate oxides subjected to X-ray radiation and electrical stress degradation Cho, Byung Jin; Kim, SJ; Ling, CH; Joo, MS; Yeo, IS, SOLID-STATE ELECTRONICS, v.44, no.7, pp.1289 - 1292, 2000-07 |
| Electrical investigation of LIGA-processed gas electron multipliers Kim, HK; Cho, MK; Ahn, SK; Cho, Gyuseong, JOURNAL OF THE KOREAN PHYSICAL SOCIETY, v.48, no.1, pp.40 - 46, 2006-01 |
| Fabrication of Step-Formed PDP Barrier Ribs with High Aspect Ratio by X-Ray Lithography Ryu, Seung-Min; Yang, Dong-Yol; So, Je-Yong; Park, Lee-Soon; Kim, Tae-Hoon, MOLECULAR CRYSTALS AND LIQUID CRYSTALS, v.514, pp.539 - 548, 2009 |
| Gas electron multiplier made by deep-etch X-ray lithography Kim, HK; Cho, Gyuseong; Kim, Do Kyung; Cho, H, JOURNAL OF THE KOREAN PHYSICAL SOCIETY, v.40, no.5, pp.812 - 819, 2002 |
| Investigation into Development of Manufacture Process for Repetitive High Aspect Ratio Microstructures using Photosensitive Paste = 감광성 페이스트를 이용한 고종횡비 마이크로 반복구조물의 제작공정 개발에 관한 연구link Ryu, Seung-Min; 류승민; et al, 한국과학기술원, 2010 |
| Reliability of thin gate oxides irradiated under X-ray lithography conditions Cho, Byung Jin; Kim, SJ; Ang, CH; Ling, CH; Joo, MS; Yeo, IS, JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES REVIEW PAPERS, v.40, no.4B, pp.2819 - 2822, 2001-04 |
| 제조공정과 사용조건을 고려한 X-선 마스크의 변형해석 = Analysis of structural distortions of an X-ray mask considering fabrication processes and writing conditionslink 김일용; Kim, Il-Yong; et al, 한국과학기술원, 1997 |
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