Showing results 1 to 2 of 2
EFFECTS OF F+ IMPLANTATION ON THE CHARACTERISTICS OF POLY-SI FILMS AND LOW-TEMPERATURE N-CH POLY-SI THIN-FILM TRANSISTORS PARK, JW; Ahn, Byung Tae; LEE, K, JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES REVIEW PAPERS, v.34, no.3, pp.1436 - 1441, 1995-03 |
Effects of Oxygen on Recrystallixation of Amorphous Silicon Films and Polysilicon TFT Characteristics Y.M.Ha; S.H.Lee; C.H.Han; Kim, Choong Ki, JOURNAL OF ELECTRONIC MATERIALS, v.23, no.1, pp.39 - 45, 1994-01 |
Discover