Showing results 7 to 9 of 9
Substrate effects on the epitaxial growth of AlN thin films using electron cyclotron resonance plasma enhanced chemical vapor deposition Soh, JW; Kim, JH; Lee, Won-Jong, JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, v.35, no.11B, pp.1518 - 1520, 1996-11 |
Substrate Effects on the Epitaxial Growth of AlN Thin Films Using Electron Cyclotron Resonance Plasma Enhanced Chemical Vapor Desposition Soh, Ju-Won; Kim, Jin-Hyeok; Lee, Won-Jong, Japanese Journal of Applied Physics, Vol.35, pp.L1518-L1520, 1996-11-15 |
Water absorption characteristics of fluorinated silicon oxide films deposited by electron cyclotron resonance plasma enhanced chemical vapor deposition using SiH4, SiF4 and O-2 Byun, KM; Lee, Won-Jong, THIN SOLID FILMS, v.376, no.1-2, pp.26 - 31, 2000-11 |
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