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Kang, Sang-Won (강상원)

Department
Department of Materials Science & Engineering(신소재공학과)
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1

Thermal stability of RuO2 thin films prepared by modified atomic layer deposition

Roh, Jae-Sung; Kang, Sang-Wonresearcher; Kwon, Se-Hun; Kim, Jin-Hyock; Ahn, Ji-Hoon; Kim, Ja-YongELSEVIER SCIENCE BVCURRENT APPLIED PHYSICS, v.12, pp.S160 - S163, 2012-09

2

Theoretical Simulation of Surface Evolution Using the Random Deposition and Surface Relaxation for Metal Oxide Film in Atomic Layer Deposition

Kwon, Se-Hun; Kim, Jin-Hyock; Ahn, Ji-Hoon; Kim, Ja-Yong; Kang, Sang-WonresearcherJournal Mater Sci TechnolJOURNAL OF MATERIALS SCIENCE & TECHNOLOGY, v.26, no.4, pp.371 - 374, 2010-04

3

Comparison of Tantalum Nitride Films for Different NH3/H-2/Ar Reactant States in Two-Step Atomic Layer Deposition

Kang, Sang-Wonresearcher; Yun, Jungheum; Kwon, Jung-DaeJapan Soc Applied PhysicsJAPANESE JOURNAL OF APPLIED PHYSICS, v.48, no.2, 2009

4

Enhancement of the TiO2 Thin-Film Dielectric Constant Through Pretreatment of Ir Substrate

Joo, Dae-Kwon; Park, Jin-Seong; Kang, Sang-WonresearcherELECTROCHEMICAL SOC INCELECTROCHEMICAL AND SOLID STATE LETTERS, v.12, no.3, pp.H77 - H79, 2009

5

Enhanced Dielectric Properties of SrTiO3 Films with a SrRuO3 Seed by Plasma-Enhanced Atomic Layer Deposition

Ahn, Ji-Hoon; Roh, Jae-Sung; Kim, Jin-Hyock; Kim, Ja-Yong; Kang, Sang-WonresearcherElectrochemical Soc IncELECTROCHEMICAL AND SOLID STATE LETTERS, v.12, no.2, pp.G5 - G8, 2009

6

Influence of substrate bias voltage on structure and properties of Cr-Mo-Si-N coatings prepared by a hybrid coating system

Hong, Seung Gyun; Kim, Kwang Ho; Kang, Sang-Wonresearcher; Kwon, Se-HunElsevier Science SaSURFACE & COATINGS TECHNOLOGY, v.203, no.5-7, pp.624 - 627, 2008-12

7

Improvement of copper diffusion barrier properties of tantalum nitride films by incorporating ruthenium using PEALD

Kang, Sang-Wonresearcher; Kim, Sung-Wook; Kwon, Se-Hun; Jeong, Seong-JunElectrochemical Soc IncJOURNAL OF THE ELECTROCHEMICAL SOCIETY, v.155, no.11, pp.H885 - H888, 2008-09

8

Improvement of morphological stability of PEALD-iridium thin films by adopting two-step annealing process

Kwon, Se-Hun; Park, Jin-Seong; Kang, Sang-Wonresearcher; Jeong, Seong-Jun; Kim, Sung-WookElectrochemical Soc IncELECTROCHEMICAL AND SOLID STATE LETTERS, v.11, no.11, pp.H303 - H305, 2008-09

9

Effect of Sr-ruthenate seed layer on dielectric properties of SrTiO3 thin films prepared by plasma-enhanced atomic layer deposition

Kim, Jin-Hyock; Kang, Sang-Wonresearcher; Roh, Jae-Sung; Kim, Ja-Yong; Ahn, Ji-HoonELECTROCHEMICAL SOC INCJOURNAL OF THE ELECTROCHEMICAL SOCIETY, v.155, no.10, pp.G185 - G188, 2008-08

10

Controlling the temperature coefficient of resistance and resistivity in RuO2-TiO2 thin films by the intermixing ratios between RuO2 and TiO2

Kang, Sang-Wonresearcher; Kwon, Se-Hun; Kim, Kwang-HoAmer Inst PhysicsAPPLIED PHYSICS LETTERS, v.92, no.18, 2008-05 View PDF (344kb)

11

Reduced electrical resistivity of reaction-sintered SiC by nitrogen doping

Lee, Young-Hyun; Shin, Hyunho; Jeon, Young-Sam; Kang, Sang-WonresearcherCambridge Univ PressJOURNAL OF MATERIALS RESEARCH, v.23, no.4, pp.1020 - 1025, 2008-04

12

Initial stages of ruthenium film growth in plasma-enhanced atomic layer deposition

Kwon, Oh-Kyum; Kim, Kwang-Ho; Kang, Sang-Wonresearcher; Kim, Jin-Hyock; Kwon, Se-Hun; Oh, Heung-RyongElectrochemical Soc IncJOURNAL OF THE ELECTROCHEMICAL SOCIETY, v.155, no.5, pp.H296 - H300, 2008-03

13

Phase control of iridium and iridium oxide thin films in atomic layer deposition

Kwon, Se-Hun; Kwak, Dong-Kee; Kim, Sung-Wook; Kang, Sang-WonresearcherAMER INST PHYSICSJOURNAL OF APPLIED PHYSICS, v.103, no.2, 2008-01 View PDF (324kb)

14

TiO2/Al2O3/TiO2 nanolaminated thin films for DRAM capacitor deposited by plasma-enhanced atomic layer deposition

Jeon, Woojin; Kang, Sang-Wonresearcher; Joo, Daekwon; Chung, Hoi-SungElectrochemical Soc IncELECTROCHEMICAL AND SOLID STATE LETTERS, v.11, no.2, pp.H19 - H21, 2008

15

Optimizing electrical and mechanical properties of reaction-sintered SiC by using different-sized SiC particles in preform

Shin H.; Kang, Sang-Wonresearcher; Jeon Y.-S.; Park J.-S.한국세라믹학회한국세라믹학회지, v.45, no.8, pp.439 - 442, 2008

16

Effect of crystallinity and nonstoichiometric region on dielectric properties of SrTiO3 films formed on Ru

Ahn, Ji-Hoon; Kim, Ja-Yong; Roh, Jae-Sung; Kang, Sang-Wonresearcher; Kim, Jin-HyockAmerican Institute of PhysicsAPPLIED PHYSICS LETTERS, v.91, no.9, 2007-08 View PDF (247kb)

17

Increment of dielectric properties of SrTiO3 thin films by SrO interlayer on Ru bottom electrodes

Kim, Ja-Yong; Ahn, Ji-Hoon; Kang, Sang-WonresearcherAMER INST PHYSICSAPPLIED PHYSICS LETTERS, v.91, no.6, 2007-08 View PDF (270kb)

18

Interface effect on dielectric constant of HfO2/Al 2O3 nanolaminate films deposited by plasma-enhanced atomic layer deposition

Park, Pan Kwi; Cha, Eun-Soo; Kang, Sang-WonresearcherAmer Inst PhysicsAPPLIED PHYSICS LETTERS, v.90, no.23, pp.232906 -, 2007-06 View PDF (289kb)

19

Step coverage modeling of thin films in atomic layer deposition

Kang, Sang-Wonresearcher; Kim, Ja-Yong; Ahn, Ji-Hoon; Kim, Jin-HyockAmer Inst PhysicsJOURNAL OF APPLIED PHYSICS, v.101, no.7, 2007-04 View PDF (776kb)

20

Improvement of the morphological stability by stacking RuO2 on ru thin films with atomic layer deposition

Kwon, Se-Hun; Kim, Jae-Hoon; Kang, Sang-Wonresearcher; Kwon, Oh-Kyum; Jeong, Seong-Jun; Kim, Sung-WookELECTROCHEMICAL SOC INCJOURNAL OF THE ELECTROCHEMICAL SOCIETY, v.154, no.9, pp.H773 - H777, 2007

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