Researcher Page

사진

Chang, Hongyoung (장홍영) C-1964-2011

Department
Department of Physics(물리학과)
Website
http://jplasma.kaist.ac.krHomePage
Research Area
Law Temperature Plasma, Tokamak Plasma

Keyword Cloud

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1

Study on SiN and SiCN film production using PE-ALD process with high-density multi-ICP source at low temperature

Song, Hohyun; Seo, Sang Hun; Chang, Hongyoungresearcher, CURRENT APPLIED PHYSICS, v.18, no.11, pp.1436 - 1440, 2018-11

2

Cutoff probe measurement in a magnetized plasma

You, K. H.; You, S. J.; Na, B. K.; et al, PHYSICS OF PLASMAS, v.25, no.1, 2018-01

3

Atmospheric Pressure Pulsed Plasma Induces Cell Death in Photosynthetic Organs via Intracellularly Generated ROS

Seol, You Bin; Kim, Jaewook; Park, Sehong; et al, SCIENTIFIC REPORTS, v.7, pp.589, 2017-04

4

Characteristics of cylindrical plasma discharge with a thermal electron beam

Bae, Inshik; Na, Byungkeun; Chang, Hongyoungresearcher, PHYSICS OF PLASMAS, v.23, no.9, pp.093513, 2016-09

5

Computational comparative study of microwave probes for plasma density measurement

Kim, Dae Woong; You, SJ; Kim, JH; et al, PLASMA SOURCES SCIENCE & TECHNOLOGY, v.25, no.3, pp.035026, 2016-06

6

Measurement of effective sheath width around the cutoff probe based on electromagnetic simulation

Kim, Dae Woong; You, SJ; Kim, JH; et al, PHYSICS OF PLASMAS, v.23, no.5, pp.4945640, 2016-05

7

Measurement of electron density using reactance cutoff probe

You, KH; You, SJ; Kim, Dae Woong; et al, PHYSICS OF PLASMAS, v.23, no.5, 2016-05

8

Development of multiple inductively coupled plasma sources using coaxial transmission line for large-area processes

Lee, Jin-Won; An, Sang-Hyuk; Kim, J. H.; et al, CURRENT APPLIED PHYSICS, v.16, no.3, pp.415 - 420, 2016-03

9

Measurement and analysis of electron-neutral collision frequency in the calibrated cutoff probe

You, KH; You, SJ; Kim, DW; et al, PHYSICS OF PLASMAS, v.23, no.3, pp.033509, 2016-03

10

Computational Characterization of a New Inductively Coupled Plasma Source for Application to Narrow Gap Plasma Processes

Kim, Dae Woong; You, Shin Jae; Kim, Jung Hyun; et al, IEEE TRANSACTIONS ON PLASMA SCIENCE, v.43, no.11, pp.3876 - 3882, 2015-11

11

Computational study on reliability of sheath width measurement by the cutoff probe in low pressure plasmas

Kim, D. -W.; You, S. -J.; Kim, J. -H.; et al, JOURNAL OF INSTRUMENTATION, v.10, pp.1 - 7, 2015-11

12

Investigation of self-oscillation using particle balance model

Bae, Inshik; Na, Byungkeun; Chang, Hongyoungresearcher, PHYSICS OF PLASMAS, v.22, no.8, 2015-08

13

Development of a high-speed impedance measurement system for dual-frequency capacitive-coupled pulsed-plasma

Lee, Hohyoung; Lee, Jeongbeom; Park, Gijung; et al, REVIEW OF SCIENTIFIC INSTRUMENTS, v.86, no.8, pp.083505, 2015-08

14

Micro-arc ignition on the oily surface of capacitively-coupled plasma

Kim, Yonghoon; Lee, Hunsu; Chang, Hong-Youngresearcher, CURRENT APPLIED PHYSICS, v.15, no.3, pp.313 - 318, 2015-03

15

Effect of reactor surface modification on the neutral gas temperature in a transformer-coupled toroidal plasma

You, Daeho; Lee, Yun-Seong; Lee, Jeong Beom; et al, CURRENT APPLIED PHYSICS, v.15, no.3, pp.183 - 189, 2015-03

16

A study on asymmetric current in plasma-mediated electrosurgery

Seol, Youbin; Kim, J. H.; Na, Byung-Keun; et al, CURRENT APPLIED PHYSICS, v.15, no.3, pp.169 - 173, 2015-03

17

On the possibility of the multiple inductively coupled plasma and helicon plasma sources for large-area processes

Lee, Jinwon; Lee, Yun-Seong; Chang, Hong-Youngresearcher; et al, PHYSICS OF PLASMAS, v.21, no.8, 2014-08

18

Measurement of effective sheath width around cutoff probe in low-pressure plasmas

Kim, Dongwook; You, S. J.; Kim, J. H.; et al, PHYSICS OF PLASMAS, v.21, no.5, 2014-05

19

Collisional effect on the time evolution of ion energy distributions outside the sheath during the afterglow of pulsed inductively coupled plasmas

Lee, J. B.; Chang, Hong-Youngresearcher; Seo, S. H., PLASMA SOURCES SCIENCE & TECHNOLOGY, v.22, no.6, 2013-12

20

The effect of the driving frequency on the optimum hole diameter for efficient multi-hole electrode RF capacitively coupled plasma

Lee, HunSu; Kim, EunAe; Lee, YunSeong; et al, THIN SOLID FILMS, v.547, pp.289 - 292, 2013-11

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