Deterministic Nanotexturing by Directional Photofluidization Lithography

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Directional photofluidization lithography enables deterministic large-area nanotexturing of periodic surface reliefs with precisely controlled structural complexity. The proposed nanotexturing technique demonstrates a hidden potential of micro- and nano fabrication methods, which allows the manipulation of the photonic and interface properties of nanotextured surfaces.
Publisher
Wiley-Blackwell
Issue Date
2011-08
Language
English
Article Type
Article
Keywords

SURFACE-RELIEF STRUCTURES; SOLAR-CELLS; ARRAYS; FABRICATION; GRATINGS; LINE

Citation

ADVANCED MATERIALS, v.23, no.29, pp.3244 - 3250

ISSN
0935-9648
URI
http://hdl.handle.net/10203/98647
Appears in Collection
MS-Journal Papers(저널논문)PH-Journal Papers(저널논문)CBE-Journal Papers(저널논문)
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