Ultraviolet-nanoimprint of 40 nm scale patterns using functionally modified fluorinated hybrid materials

Abstract

Photo-curable fluorinated organic - inorganic hybrid materials (F-hybrimers) present high modulus, low surface tension, low shrinkage, and high etching resistance. These are essential properties as a mould and as a resist for nanoimprint lithography (\NIL). In order to control the properties of the fluorinated hybrimer, in this study it is modified by the optimal addition of appropriate acryl monomers as a mould and as a resist material for NIL. Accordingly, the viscosity in terms of the resist material and the modulus in terms of the mould material are modulated ( low v F-hybrimer and flexible F-hybrimer). Finally, 30 - 40 nm half-pitch line patterns are imprinted, using identically modified F-hybrimer material systems as a mould and a resist.