Synthesis and characterization of photopatternable epoxy hybrid materials for the fabrication of thick and thermally stable microstructures with a high aspect ratio

Photosensitive cycloaliphatic-epoxy oligosiloxane was synthesized using a nonhydrolytic sol-gel reaction for the fabrication of thick and thermally stable microstructures with high aspect ratios. Its formation was confirmed by Si-29 and pH nuclear magnetic resonance spectroscopy, small-angle neutron scattering, and Fourier transform infrared spectroscopy. Photocuring of cycloaliphatic-epoxy oligosiloxane resin resulted in a thermally stable epoxy hybrid material (epoxy hybrimer). Micropatterns with a high aspect ratio (>5), an excellent sidewall shape, and low shrinkage were fabricated directly from these materials using a simple photolithographic process. The fabricated micropattern sustained temperatures of up to 250 degrees C. (C) 2008 Wiley Periodicals,
Publisher
Wiley-Blackwell
Issue Date
2008-06
Language
ENG
Keywords

PHOTOINITIATED CATIONIC-POLYMERIZATION; HARD COATINGS; PHOTOPOLYMERIZATION; PHOTORESIST; INHIBITION; MONOMERS; RESINS; GLASS

Citation

JOURNAL OF APPLIED POLYMER SCIENCE, v.108, no.5, pp.3169 - 3176

ISSN
0021-8995
DOI
10.1002/app.27966
URI
http://hdl.handle.net/10203/9680
Appears in Collection
MS-Journal Papers(저널논문)
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