Cubic-Structured HfLaO for the Blocking Layer of a Charge-Trap Type Flash Memory Device

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Cubic-structured HfLaO with a high kappa-value of 30-40 is used for the blocking layer in a charge-trap type memory device. Compared to an Al(2)O(3) blocking layer, the single HfLaO blocking layer shows lower leakage current, faster program speed, larger memory window, and greater robustness at high voltage, but inferior charge retention due to lower conduction band offset (CBO). When an Al(2)O(3) layer is inserted between the HfLaO and the charge trap layers, good charge retention, even at 150 degrees C, is achieved, maintaining the advantages of HfLaO. (c) 2010 The Japan Society of Applied Physics
Publisher
JAPAN SOC APPLIED PHYSICS
Issue Date
2010-08
Language
English
Article Type
Article
Citation

APPLIED PHYSICS EXPRESS, v.3, no.9

ISSN
1882-0778
DOI
10.1143/APEX.3.091501
URI
http://hdl.handle.net/10203/95042
Appears in Collection
EE-Journal Papers(저널논문)
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