Rapid vapor-phase fabrication of organic-inorganic hybrid superlattices with monolayer precision

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We report a new layer-by-layer growth method of self-assembled organic multilayer thin films based on gas-phase reactions. In the present molecular layer deposition (MILD) process, alkylsiloxane self-assembled multilayers (SAMS) were grown under vacuum by repeated sequential adsorptions of C= C-terminated alkylsilane and titanium hydroxide. The MLD method is a self-limiting layer-by-layer growth process, and is perfectly compatible with the atomic layer deposition (ALD) method. The SAMS films prepared exhibited good thermal and mechanical stability, and various unique electrical properties. The MLD method, combined with ALD, was applied to the preparation of organic - inorganic hybrid nanolaminate films in the ALD chamber. The organic - inorganic hybrid superlattices were then used as active mediums for two-terminal electrical bistable devices. The advantages of the MLD method with ALD include accurate control of film thickness, large-scale uniformity, highly conformal layering, sharp interfaces, and a vast library of possible materials. The MILD method with ALD is an ideal fabrication technique for various organic - inorganic hybrid superlattices.
Publisher
AMER CHEMICAL SOC
Issue Date
2007-12
Language
English
Article Type
Article
Keywords

ATOMIC LAYER DEPOSITION; SELF-ASSEMBLED MONOLAYERS; FIELD-EFFECT TRANSISTORS; TITANIUM-OXIDE; LOW-VOLTAGE; INSULATING FILMS; MULTILAYERS; ADSORPTION; SURFACES; TEMPERATURE

Citation

JOURNAL OF THE AMERICAN CHEMICAL SOCIETY, v.129, no.51, pp.16034 - 16041

ISSN
0002-7863
DOI
10.1021/ja075664o
URI
http://hdl.handle.net/10203/93135
Appears in Collection
EE-Journal Papers(저널논문)
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