Inorganic polymer photoresist for direct ceramic patterning by photolithography
A novel negative, inorganic polymer photoresist was demonstrated to be suitable for simple and direct fabrication of tribological SiCN-based ceramic microstructures via UV photolithography and subsequent pyrolysis at 800 degrees C.
- Publisher
- ROYAL SOC CHEMISTRY
- Issue Date
- 2007
- Language
- English
- Article Type
- Article
- Keywords
SICN MEMS; FABRICATION; MICROSTRUCTURES; COMPOSITES
- Citation
CHEMICAL COMMUNICATIONS, no.39, pp.4021 - 4023
- ISSN
- 1359-7345
- Appears in Collection
- BiS-Journal Papers(저널논문)
- Files in This Item
- There are no files associated with this item.
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