Low voltage operating InGaZnO(4) thin film transistors using high-k MgO-Ba(0.6)Sr(0.4)TiO(3) composite gate dielectric on plastic substrate

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The authors report on the dielectric and leakage current properties of room temperature grown MgO-Ba(0.6)Sr(0.4)TiO(3) (MgO-BST) composite thin films to be utilized InGaZnO(4) thin films transistors (TFTs) fabricated on a polyethylene terephthalate (PET) substrate. The InGaZnO(4) TFTs with MgO-BST gate dielectrics exhibited low operation voltage of 4 V, high on/off current ratio of 4.13x10(6), and high field effect mobility of 10.86 cm(2)/V s. These results verify that a room temperature grown MgO-BST gate dielectric is a good candidate for producing high performance InGaZnO(4) TFTs on plastic substrates. (C) 2008 American Institute of Physics.
Publisher
AMER INST PHYSICS
Issue Date
2008-07
Language
English
Article Type
Article
Keywords

AMORPHOUS OXIDE SEMICONDUCTORS

Citation

APPLIED PHYSICS LETTERS, v.93, no.3

ISSN
0003-6951
DOI
10.1063/1.2954014
URI
http://hdl.handle.net/10203/92545
Appears in Collection
MS-Journal Papers(저널논문)
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