The two-photon stereolithography (TPS) process is a promising technique for the fabrication of real three-dimensional (3D) nano/micro-structures via application of a femto-second laser. In TPS, when a near-infrared ultrashort-pulsed laser is closely focused onto a confined volume of photocurable resin, only the local area at the center of the focus is cured. Therefore, real 3D microstructures with resolution under the diffraction limit can be fabricated through a layer-by-layer accumulative technique. This process provides opportunities to develop neo-conceptive nano/micro devices in IT/BT industries. However, a number of issues, including development of effective fabrication methods, highly sensitive and functional materials, and neo-conceptive devices using TPS, must be addressed for the realization of industrial application of TPS. In this review article, we discuss our efforts related to TPS: effective fabrication methods, diverse two-photon curable materials for high functional devices, and applications.