Direct nano-patterning methods using nonlinear absorption in photopolymerization induced by a femtosecond laser

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Investigation into the methods of direct fabrication for submicron-detailed patterns without the use of any photomask was carried out using two-photon polymerization (TPP). Some patterns can be fabricated easily in the range of several micrometers by solidifying inside a photopolymerizable resin by a scanning process using a volume-pixel (voxel) matrix that is transformed from a bitmap figure file. The voxels are generated consecutively to merge into adjoining voxels in the process of fabricating a pattern. The resolution of a fabricated pattern can be obtained under the diffraction limit of a laser beam due to the nonlinear absorption phenomenon. In this paper, a top-down reverse building technique was introduced to fabricate a polymeric pattern on a metal layer. Also, a contour offset algorithm (COA) and a beam expanding method have been attempted to make precise patterns and to enlarge the working area. Through this work, several patterns for various applications on nano- and microtechnology were fabricated on a glass plate and a thin metal layer to demonstrate the usefulness of the developed algorithm.
Publisher
WORLD SCIENTIFIC PUBL CO PTE LTD
Issue Date
2005-09
Language
English
Article Type
Article
Keywords

2-PHOTON-ABSORPTION PHOTOPOLYMERIZATION; IMPRINT LITHOGRAPHY; FABRICATION; MICROFABRICATION; NANOFABRICATION; MICROMACHINES; RESOLUTION; FEATURES

Citation

JOURNAL OF NONLINEAR OPTICAL PHYSICS & MATERIALS, v.14, pp.331 - 340

ISSN
0218-8635
DOI
10.1142/S0218863505002773
URI
http://hdl.handle.net/10203/90707
Appears in Collection
ME-Journal Papers(저널논문)PH-Journal Papers(저널논문)
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