Integration of microwave phase shifter with BST varactor onto TiO2/Si wafer

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dc.contributor.authorKim, KBko
dc.contributor.authorYun, TSko
dc.contributor.authorLee, JCko
dc.contributor.authorChaker, Mko
dc.contributor.authorPark, Chul Soonko
dc.contributor.authorWu, Kko
dc.date.accessioned2013-03-06T22:15:25Z-
dc.date.available2013-03-06T22:15:25Z-
dc.date.created2012-02-06-
dc.date.created2012-02-06-
dc.date.created2012-02-06-
dc.date.issued2007-07-
dc.identifier.citationELECTRONICS LETTERS, v.43, pp.757 - 759-
dc.identifier.issn0013-5194-
dc.identifier.urihttp://hdl.handle.net/10203/88652-
dc.description.abstractA BST ferroelectric thin-film microwave phase shifter with interdigital capacitors on TiO2/Si substrate is presented. The interdigital capacitors have 230 mu m signal width, 100 pm signal to ground gap, and 10 mu m finger gap. The device, with phase shifts of 142 degrees and FoM of 107.3 degrees/dB applied voltage of 50 V at 16 GHz, has been realised. The TiO2 buffer layer grown by ALD enables successful integration of BST-based microwave tunable devices with Si wafer.-
dc.languageEnglish-
dc.publisherINST ENGINEERING TECHNOLOGY-IET-
dc.titleIntegration of microwave phase shifter with BST varactor onto TiO2/Si wafer-
dc.typeArticle-
dc.identifier.wosid000248733700013-
dc.identifier.scopusid2-s2.0-34547637044-
dc.type.rimsART-
dc.citation.volume43-
dc.citation.beginningpage757-
dc.citation.endingpage759-
dc.citation.publicationnameELECTRONICS LETTERS-
dc.identifier.doi10.1049/el:20070448-
dc.contributor.localauthorPark, Chul Soon-
dc.contributor.nonIdAuthorKim, KB-
dc.contributor.nonIdAuthorYun, TS-
dc.contributor.nonIdAuthorLee, JC-
dc.contributor.nonIdAuthorChaker, M-
dc.contributor.nonIdAuthorWu, K-
dc.type.journalArticleArticle-
dc.subject.keywordPlusBUFFER LAYERS-
dc.subject.keywordPlusTHIN-FILMS-
dc.subject.keywordPlusTA2O5-
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