Nanoscale ultrathin body PMOSFETs with raised selective germanium source/drain

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dc.contributor.authorChoi, Yang-Kyuko
dc.contributor.authorHa, DWko
dc.contributor.authorKing, TJko
dc.contributor.authorHu, CMko
dc.date.accessioned2013-03-05T03:16:52Z-
dc.date.available2013-03-05T03:16:52Z-
dc.date.created2012-02-06-
dc.date.created2012-02-06-
dc.date.issued2001-09-
dc.identifier.citationIEEE ELECTRON DEVICE LETTERS, v.22, no.9, pp.447 - 448-
dc.identifier.issn0741-3106-
dc.identifier.urihttp://hdl.handle.net/10203/85234-
dc.description.abstractNanoscale ultrathin body (UTB) p-channel MOSFETs with body thickness down to 4 nm and raised source and drain (S/D) using selectively deposited Ge are demonstrated for the first time. Devices with gate length down to 30 mn show high drive current, low off current, and excellent short-channel behavior. Mobility enhancement and threshold-voltage shift due to the quantum confinement of inversion charge in the ultrathin body are investigated.-
dc.languageEnglish-
dc.publisherIEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC-
dc.titleNanoscale ultrathin body PMOSFETs with raised selective germanium source/drain-
dc.typeArticle-
dc.identifier.wosid000170716300011-
dc.identifier.scopusid2-s2.0-0035446820-
dc.type.rimsART-
dc.citation.volume22-
dc.citation.issue9-
dc.citation.beginningpage447-
dc.citation.endingpage448-
dc.citation.publicationnameIEEE ELECTRON DEVICE LETTERS-
dc.contributor.localauthorChoi, Yang-Kyu-
dc.contributor.nonIdAuthorHa, DW-
dc.contributor.nonIdAuthorKing, TJ-
dc.contributor.nonIdAuthorHu, CM-
dc.type.journalArticleArticle-
dc.subject.keywordAuthormobility enhancement-
dc.subject.keywordAuthornano-CMOS-
dc.subject.keywordAuthorquantum confinement of inversion charge-
dc.subject.keywordAuthorraised S/D-
dc.subject.keywordAuthorselective Ge-
dc.subject.keywordAuthorthreshold voltage shift-
dc.subject.keywordAuthorultrathin body-
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