Measured results on symmetric dual-level spiral inductors for RF ICs
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | Lee, Sang-Gug | ko |
| dc.contributor.author | Shin, SB | ko |
| dc.contributor.author | Ihm, GJ | ko |
| dc.date.accessioned | 2013-03-04T21:14:24Z | - |
| dc.date.available | 2013-03-04T21:14:24Z | - |
| dc.date.created | 2012-02-06 | - |
| dc.date.created | 2012-02-06 | - |
| dc.date.issued | 2001-06 | - |
| dc.identifier.citation | IEICE TRANSACTIONS ON ELECTRONICS, v.E84C, no.6, pp.845 - 848 | - |
| dc.identifier.issn | 0916-8524 | - |
| dc.identifier.uri | http://hdl.handle.net/10203/84166 | - |
| dc.description.abstract | A completely symmetric dual-level spiral inductor structure is proposed. The symmetry, area efficiency, the size dependence of the coupling factor, and the quality factors of the dual-level inductors are evaluated and compared with that of the single-level. This work demonstrates that, with most RF applications, the dual-level inductors are the better choice than the single-level. | - |
| dc.language | English | - |
| dc.publisher | IEICE-INST ELECTRONICS INFORMATION COMMUNICATIONS ENG | - |
| dc.subject | TECHNOLOGY | - |
| dc.title | Measured results on symmetric dual-level spiral inductors for RF ICs | - |
| dc.type | Article | - |
| dc.identifier.wosid | 000169160400020 | - |
| dc.identifier.scopusid | 2-s2.0-0035367283 | - |
| dc.type.rims | ART | - |
| dc.citation.volume | E84C | - |
| dc.citation.issue | 6 | - |
| dc.citation.beginningpage | 845 | - |
| dc.citation.endingpage | 848 | - |
| dc.citation.publicationname | IEICE TRANSACTIONS ON ELECTRONICS | - |
| dc.contributor.localauthor | Lee, Sang-Gug | - |
| dc.contributor.nonIdAuthor | Shin, SB | - |
| dc.contributor.nonIdAuthor | Ihm, GJ | - |
| dc.type.journalArticle | Article | - |
| dc.subject.keywordAuthor | spiral inductors | - |
| dc.subject.keywordAuthor | symmetric | - |
| dc.subject.keywordAuthor | RF ICs | - |
| dc.subject.keywordAuthor | quality factor | - |
| dc.subject.keywordPlus | TECHNOLOGY | - |
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