RF-Sputtered Vanadium Oxide Thin Films : Effect of OxygenPartial Pressure on Structural and Electrochemical Properties
- Publisher
- 대한화학회
- Issue Date
- 2001-09
- Language
- Korean
- Citation
BULLETIN OF THE KOREAN CHEMICAL SOCIETY, v.22, no.9, pp.1015 - 1018
- ISSN
- 0253-2964
- Appears in Collection
- EE-Journal Papers(저널논문)
- Files in This Item
- There are no files associated with this item.
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